Scanner Arc Illumination And Impact On EUV Photomasks And Scanner Imaging
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30th European and - GBV
9231 09 ScannerarcilluminationandimpactonEUVphotomasksandscannerimaging [9231-24] iii
Program - VDE e.V.
16:20 Scanner Arc Illumination and Impact on EUV Photomasks and Scanner Imaging R. Capelli, A. Garetto, K. Magnusson, T. Scherübl, Carl Zeiss SMS GmbH, Jena, Germany 16:40 High NA Optics the extension path of EUV Lithography T. Heil, Carl Zeiss SMT GmbH, Oberkochen, Germany Session 5 EUV Mask Technology Session Chairs:
PROCEEDINGS OF SPIE
EUV LITHOGRAPHY 9231 08 Imaging performance and challenges of 10nm and 7nm logic nodes with 0.33 NA EUV [9231-18] 9231 09 Scanner arc illumination and impact on EUV photomasks and scanner imaging [9231-24] LLL 3URF RI63,(9RO Downloaded From: https://www.spiedigitallibrary.org/conference-proceedings-of-spie on 08 Feb 2021
Mask Synthesis using Machine Learning Software & Hardware
 Renzo Capelli et al, Scanner arc illumination and impact on EUV photomasks and scanner imaging , Proc. SPIE 9231, 30th European Mask and Lithography Conference, 923109 (17 October 2014) © 2020 Synopsys, Inc. 15