A New Lithography Hotspot Detection Framework Based On AdaBoost Classifier And Simplified Feature Extraction

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PROCEEDINGS OF SPIE

9427 03 High coverage of litho hotspot detection by weak pattern scoring [9427-2] 9427 04 A pattern-based methodology for optimizing stitches in double-patterning technology [9427-3] 9427 05 Fast detection of manufacturing systematic design pattern failures causing device yield loss [9427-4]

A New Lithography Hotspot Detection Framework Based on

A New Lithography Hotspot Detection Framework Based on AdaBoost Classi er and Simpli ed Feature Extraction Tetsuaki Matsunawa a, Jhih-Rong Gao b, Bei Yu b and David Z. Pan b a Center for Semiconductor Research & Development, Toshiba Corp., Kawasaki, Japan b ECE Department, Univ. of Texas at Austin, Austin, TX, USA

A New Lithography Hotspot Detection Framework Based on

A New Lithography Hotspot Detection Framework Based on AdaBoost Classifier and Simplified Feature Extraction Tetsuaki Matsunawa1,Jhih:Rong Gao2,Bei Yu2 and David Z. Pan2 1Toshiba Corporation 2The University ofTexas atAustin